Products / In situ
High / low-temperature XRD cell

XRD in situ cell

High / low-temperature XRD cell

XRD characterization from −196 to 600°C under controlled gas or vacuum.

Function
Powder, film or bulk-sample XRD from −196 to 600°C under controlled gas or vacuum.
Beam path / detection
Transmission or reflection geometry; Kapton, quartz, sapphire or Be window options.

TECHNICAL SPECIFICATIONS

Specifications and configuration

Function
Powder, film or bulk-sample XRD from −196 to 600°C under controlled gas or vacuum.
Beam path / detection
Transmission or reflection geometry; Kapton, quartz, sapphire or Be window options.
Temperature control
Heater rods / wires and K/S thermocouples; cryogenic cold finger / cooling channels and PID control.
Atmosphere
Inert or reactive gas; optional vacuum port. Request vacuum specifications.
Sealing / structure
Thermal chamber with graphite / metal C-ring / copper seals for heating and indium / metal seals for cooling.
Sample mounting
Sample stage or heating block centers the sample in the beam and uniform-temperature zone.

Materials, windows, temperature control and interfaces are selected for the experiment. Confirm instrument compatibility and the final technical agreement.

LABORATORY PLANNING

Prepare your laboratory

Compatibility
Confirm beam geometry, cell mounting, window material, sample thickness and instrument clearance.
Utilities
Match gas, liquid, electrical and heating / cooling connections to the experiment.
Installation review
Confirm sealing, material compatibility and operating limits with the technical team.

Cell requirements depend on the selected materials, interfaces and host instrument.

RESOURCES & SUPPORT

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