COMPARE INSTRUMENTS
Compare within each technique
S50 and S1200 are separate instruments. Performance and available options depend on the selected configuration.
XAFS
| Configuration | RapidXAFS 1M | RapidXAFS 2M | RapidXAFS 2M Smart | RapidXAFS 2D Ultra |
|---|---|---|---|---|
| Energy range | 4.5–20 keV | 4.5–20 keV; extendable to 25 keV | 4.5–20 keV; extendable to 25 keV | 4.5–20 keV; extendable to 25 keV |
| Energy resolution | XANES: 0.5–1.5 eV; EXAFS: 1.5–10 eV | XANES: 0.5–1.5 eV; EXAFS: 1.5–10 eV | XANES: 0.5–1.5 eV; EXAFS: 1.5–10 eV | XANES: 0.5–1.5 eV; EXAFS: 1.5–10 eV |
| Maximum flux at sample | 1 × 10⁶ photons/s at 8 keV | 3 × 10⁶ photons/s at 8 keV | 3 × 10⁶ photons/s at 8 keV | 5 × 10⁶ photons/s at 8 keV; optional rotating anode: up to 10⁷ photons/s |
| XAFS modes | Transmission | Transmission | Transmission | Transmission and fluorescence |
| XES module | Not available | Optional | Optional | Optional |
| In situ accessories | Standard cells supported | Multiple cell configurations | Confirm configuration | Confirm configuration |
| Automation | Confirm configuration | Confirm configuration | Robotic sample loading and unloading | Confirm configuration |
| Simultaneous dual-element measurement | Confirm configuration | Confirm configuration | Confirm configuration | Supported |
XES
| Configuration | XEScope | Rapid XES |
|---|---|---|
| Energy range | 1.1–8 keV | 4.5–20 keV |
| Energy resolution | Up to 0.5 eV; confirm measurement conditions | ≤1 eV (Cu Kα line) |
| Measurement | X-ray fluorescence emission spectroscopy | Confirm configuration |
| Detection limit | Confirm configuration | 50 ppm (brochure reference; sample and conditions dependent) |
| Rapid XES pro source | Confirm configuration | 4 kW |
| Rapid XES pro mode | Confirm configuration | XES |
XRD
| Configuration | Sinospec D10 / Panda D10 | Sinospec P10 | Sinospec S50 | Sinospec S1200 |
|---|---|---|---|---|
| Source power | 600–1600 W; configuration dependent | Confirm configuration | Confirm configuration | Confirm configuration |
| Goniometer | θ/θ | θ/θ | Four-circle kappa | Confirm configuration |
| Detection | High-resolution 1D or 2D detector | Confirm configuration | Confirm configuration | Confirm configuration |
| Applications | Powders, thin films and in situ environments | Confirm configuration | Confirm configuration | Confirm configuration |
| Sample positions | Confirm configuration | Up to 12 × 8 | Confirm configuration | Confirm configuration |
| Automation | Confirm configuration | Multiple independently controlled mechanical axes | Confirm configuration | Confirm configuration |
| Workflow | Confirm configuration | Automated sample handling and phase / quantitative analysis | Confirm configuration | Confirm configuration |
| Instrument type | Confirm configuration | Confirm configuration | Single-crystal X-ray diffractometer | Confirm configuration |
| Source configuration | Confirm configuration | Confirm configuration | Request the model-specific technical specification | Confirm configuration |
| Instrument series | Confirm configuration | Confirm configuration | Confirm configuration | XRD |
| Technical specification | Confirm configuration | Confirm configuration | Confirm configuration | Request the dedicated S1200 specification |
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